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NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

Matches from Class Search for polymer:

Instruction:Total Records:   330
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Details
 
Formula
 
IUPAC Name
 
Xe/teflon xenon in teflon
Ti/(-C4HS((CH2)5CH3)-)n titanium/poly(3-hexylthiophene)
Pd(C12H8N2)(CH3C(O)O)2/(-CH-CH2-(C6H5))n polystyrene bound (1,10-phenanthroline) palladium acetate
O,Cl in (C6H5NC6H4)n oxygen, chlorine impurity in poly(carbazole)
Mo4S4Cl4 molybdenum sulfide chloride polymeric cubane cluster
inhomogeneous plasma polymerization product poly(methyl trimethoxysilane)
HSCH2(CH2)9CH(OH)+C18H37SiCl3 11-mercapto-1-undecanol alkyltrichlorosilane
GaMo4S8 gallium molybdenum sulfide polymeric cubane cluster
GaMo4S4Te4 gallium molybdenum telluride polymeric cubane cluster
CxHy(Cl)vNOz chlorine-doped poly(aniline) oxide
Cu/(-C4HS((CH2)5CH3)-)n copper/poly(3-hexylthiophene)
Cr/(-CHC(C6H5)-)n chromium/poly(phenylacetylene)
Cr/(-CH2CH(C(O)CH3)-)n chromium/poly(vinyl methyl ketone)
Cr/(-C6H2(CH3)2O-)n chromium/poly(2,6-dimethyl-1,4-phenylene oxide)
Cr/(-C4HS((CH2)5CH3)-)n chromium/poly(3-hexylthiophene)
Cr/(=(C10H2O4)=N-(C6H4)-O-(C6H4)-N=)n chromium/poly(N,N'-(p,p'-oxydiphenylene)pyromellitimide)
CH3(C2H5O)CHO(CH2)5O-(CH2CH2O)x-H acetal masked polyether
CF3[(-OCF(CF3)C-F2)n(-OC-F2)m]xOCF3 Fomblin Y
Ca(OH)2/(-CH2CH(C(O)OH)-)n poly(acrylic acid)/calcium hydroxide(CasNo:1305-62-0)
-C6H5Si2O3C6H5- phenylsilicone resin
C6H5NHC6H4NHC6H5 N,N'-Diphenyl-1,4-phenylenediamine [poly(aniline) oligomer]
-C6H2S2- poly(thienothiophene)
C21H14O2F8N4 poly(aminocarbonylamino-phenylenemethylene-phenyleneaminocarbonylamino-octafluorophenylene)
C21H14O2F4N4 poly(aminocarbonylamino-phenylenemethylene-phenyleneaminocarbonylamino-tetrafluorophenylene)
C20H16O4F6N2 poly(oxycarbonylamino-phenylenemethylene-phenyleneaminocarbonyloxy-hexafluoropentane-diyll)
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