NIST High Temp. Superconducting Materials (HTS) Database:

NIST Standard Reference Database 62

Last Update to Data Content: 1996

DOI: https://doi.org/10.18434/T4KP8J


Bibliographic Information

Title: The Magnetic and Transport Properties of High-Critical- Current Tl2Ba2Ca2Cu3Ox
Author(s): M.L. Chu, H.L. Chang, C. Wang, J.Y. Juang, T.M. Uen, and Y.S. Gou
Publication: Applied Physics Letters Volume: 59 Issue: 9 Year: 1991 Page(s): 1123-1125
Editor(s): Not Available
Publisher: American Institute of Physics
Language: English
Notes: Not Available
Keywords: Material Specification, Critical Current Density

Materials and Properties

Tl:2223; [Tl-Ba-Ca-Cu-O]
Material Specification for Tl:2223; [Tl-Ba-Ca-Cu-O] Process: Sputtering
Notes: The authors cite H.L. Chang et al., Jpn. J. Appl. Phys. Vol. 28, L631 (1989), and summarize the procedure as follows. "Thin films with a typical thickness of 1 µm were prepared by a single-target dc sputtering method... we have used LaAlO3(100) single-crystal substrates ZrO2, and MgO single-crystal substrates... to improve the lattice matching and dielectric properties... The as-deposited films were wrapped with a bulk Tl2Ba2Ca2Cu3Ox pellet for compensation using a gold foil. The bulk pellet was carefully arranged to avoid touching the film surface. The whole package was then sealed with about (80 kPa = 600 torr) of oxygen in a quartz tube and annealed at 880 °C for 15 min."
Formula: Tl2Ba2Ca2Cu3Ox
Informal Name: Tl:2223
Chemical Family: Tl-Ba-Ca-Cu-O
Chemical Class: Oxide
Structure Type: Polycrystalline
Manufacturer: In House
Commercial Name: In House
Production Date:
Lot Number:
Production Form:

Critical Current Density for Tl:2223; [Tl-Ba-Ca-Cu-O]
Temperature (K) Magnetic Field (kA/m) Critical Current Density (kA/cm2)
50 0 35300
60 0 27000
70 0 21500
80 0 13200
90 0 6800
95 0 3120
102 0 190
105 0 7
106 0 0.1
84 5 6800
84 25 2400
84 60 750
84 100 215
84 150 42
90.5 1 3500
90.5 2 3200
90.5 10 1500
90.5 40 320
90.5 70 56
90.5 100 13
95 1 2400
95 3 1800
95 15 620
95 30 240
95 50 46
95 70 12
Measurement Method: Four-probe method
"... the films were patterned into a 10-µm-wide, 125-µm-long bridge by standard lithographical processes for... transport measurements by the usual four-probe method with the magnetic field applied perpendicular to the film surface... The critical current density was defined by a 1 µV/cm criterion."

Cautions: Evaluated Data
Digitized data were obtained from Figure 2 and Figure 3 of the paper.