NIST High Temp. Superconducting Materials (HTS) Database:

NIST Standard Reference Database 62

Last Update to Data Content: 1996

DOI: https://doi.org/10.18434/T4KP8J


Bibliographic Information

Title: C-Axis Oriented Thin Bi2Sr2CaCu2O8+δ-Films Prepared by Flash-Evaporation
Author(s): C. Stolzel, M. Huth, and H. Adrian
Publication: Physica C Volume: 204 Issue: Not Available Year: 1992 Page(s): 15-20
Editor(s): Not Available
Publisher: Elsevier Science Publishers B.V.
Language: English
Notes: Not Available
Keywords: Material Specification, Critical Current Density, Resistivity (normal state)

Materials and Properties

Bi:2212; [Bi-Sr-Ca-Cu-O]
Material Specification for Bi:2212; [Bi-Sr-Ca-Cu-O] Process: Evaporation
Notes: "Fine powders of the nominal composition Bi2Sr2CaCu2O8+δ and other stoichiometries were prepared by the conventional solid state reaction. According to the desired stoichiometry adequate amounts of high purity Bi2O3, SrCO3, CaCO3 and CuO were mixed and calcined at 830 °C for 24 h in air. The reacted products were ground into fine particles with diameters less than 40 µm, pressed to small pellets and sintered at 835 °C in air for 3 days. The resulting pellets were reground to fine particles with diameters less than 40 µm... The percursor is dropped onto a resistivity heated boat by a vibration mechanism... a tantalum boat was chosen, which was routinely heated up to 1900 °C. After evacuating the recipient below (1 mPa) 400 nm thick films were normally deposited onto unheated 100-SrTiO3 substrates (T=150°C due to the radiation of the tantalum boat)... The deposited films were annealed in a tube-furnace."
Formula: Bi2Sr2CaCu2O8+x
Informal Name: Bi:2212
Chemical Family: Bi-Sr-Ca-Cu-O
Chemical Class: Oxide
Structure Type: Polycrystalline
Manufacturer: In House
Commercial Name: In House
Production Date:
Lot Number:
Production Form: Thin Film

Critical Current Density for Bi:2212; [Bi-Sr-Ca-Cu-O]
Angle (c,H) (degrees) Magnetic Field (T) Temperature (K) Critical Current Density (kA/cm2)
90 0.0 4.2 98.9
90 0.5 4.2 97.6
90 1.0 4.2 96.4
90 2.0 4.2 93.9
90 3.0 4.2 91.5
90 4.0 4.2 89.0
90 5.0 4.2 87.7
90 6.0 4.2 85.2
90 0.0 10 96.6
90 0.5 10 94.2
90 1.0 10 91.9
90 2.0 10 88.3
90 3.0 10 85.8
90 4.0 10 83.3
90 5.0 10 82.0
90 6.0 10 79.6
90 0.0 20 85.2
90 0.5 20 84.0
90 1.0 20 82.8
90 2.0 20 79.2
90 3.0 20 77.8
90 4.0 20 74.2
90 5.0 20 71.8
90 6.0 20 70.5
90 0.0 30 72.7
90 0.5 30 70.4
90 1.0 30 69.1
90 2.0 30 65.5
90 3.0 30 61.9
90 4.0 30 60.6
90 5.0 30 58.1
90 6.0 30 56.8
90 0.0 40 54.5
90 0.5 40 52.2
90 1.0 40 49.8
90 2.0 40 46.2
90 3.0 40 43.7
90 4.0 40 40.1
90 5.0 40 37.7
90 6.0 40 35.2
90 0.0 50 38.6
90 0.5 50 36.3
90 1.0 50 33.9
90 2.0 50 30.3
90 3.0 50 27.8
90 4.0 50 25.4
90 5.0 50 24.0
90 6.0 50 21.6
90 0.0 60 21.6
90 0.5 60 19.2
90 1.0 60 16.9
90 2.0 60 14.4
90 3.0 60 13.1
90 4.0 60 11.7
90 5.0 60 10.4
90 6.0 60 9.1
90 0.0 70 5.7
90 0.5 70 4.4
90 1.0 70 3.2
90 2.0 70 1.9
90 3.0 70 1.7
90 4.0 70 1.5
90 5.0 70 1.3
90 6.0 70 1.1
0 0.0 4.2 99.9
0 0.5 4.2 56.0
0 1.5 4.2 35.5
0 2.5 4.2 29.9
0 3.6 4.2 28.8
0 5.0 4.2 23.9
0 6.0 4.2 23.1
0 0.0 10 75.5
0 1.0 10 36.1
0 2.5 10 25.9
0 4.0 10 21.4
0 5.0 10 20.7
0 6.0 10 20.0
0 0.0 20 65.6
0 0.5 20 31.9
0 2.0 20 17.2
0 3.0 20 14.5
0 4.5 20 10.4
0 5.5 20 7.6
0 6.0 20 7.5
0 0.0 30 56.9
0 0.5 30 20.9
0 2.0 30 4.8
0 3.5 30 0.6
0 4.5 30 0.2
0 5.5 30 0.06
0 6.0 30 0.04
0 0.0 40 49.5
0 0.5 40 4.4
0 1.5 40 0.1
0 2.0 40 0.03
0 0.0 50 37.3
0 0.2 50 6.8
0 0.5 50 0.1
0 1.0 50 0.01
Measurement Method: Electrical resistance
"For the measurement of the transport properties, a 250 µm wide bridge was prepared by scratching with a needle. The films were fixed on a rotatable sample-holder...in order to vary the angle θ between the c-axis and the magnetic field. The direction of the current was always parallel to the axis of rotation and therefore orthogonal to the external field... Resistive measurements were performed using a current density of 2 A/m2... Critical current density measurements were performed using a 1 µV-criterion, which corresponds to an electric field of 5 µV/cm."

Cautions: Evaluated Data
Digitized data were obtained from Figures 5 and 6 of the paper. Angle(c,H) is the angle between the c-axis and the applied magnetic field. Angle(c,H) = 0° means the magnetic field was applied parallel to the c-axis. For angle(c,H) = 90°, the field is perpendicular to the c-axis.
Resistivity (normal state) for Bi:2212; [Bi-Sr-Ca-Cu-O]
Angle (c,H) (degrees) Temperature (K) Magnetic Field (T) Resistivity (normal state) (mΩ·cm)
0 77 0 0.0
0 80 0 0.3
0 83 0 1.0
0 87 0 1.5
0 92 0 1.7
0 100 0 1.9
0 59 1 0.0
0 70 1 0.2
0 75 1 0.5
0 79 1 0.7
0 82 1 1.0
0 88 1 1.6
0 100 1 1.9
0 45 2 0.0
0 55 2 0.0
0 66 2 0.2
0 74 2 0.5
0 79 2 1.0
0 84 2 1.3
0 88 2 1.6
0 100 2 1.9
0 40 4 0.0
0 50 4 0.1
0 61 4 0.2
0 71 4 0.6
0 78 4 1.0
0 82 4 1.3
0 88 4 1.6
0 100 4 1.9
0 41 6 0.0
0 51 6 0.1
0 61 6 0.3
0 70 6 0.7
0 77 6 1.0
0 82 6 1.3
0 88 6 1.6
0 100 6 1.9
90 74 6 0.0
90 79 6 0.2
90 81 6 0.6
90 83 6 1.0
90 86 6 1.4
90 89 6 1.6
90 100 6 1.9
Measurement Method: Electrical resistance
"For the measurement of the transport properties, a 250 µm wide bridge was prepared by scratching with a needle. The films were fixed on a rotatable sample-holder...in order to vary the angle θ between the c-axis and the magnetic field. The direction of the current was always parallel to the axis of rotation and therefore orthogonal to the external field... Resistive measurements were performed using a current density of 2 A/m2... Critical current density measurements were performed using a 1 µV-criterion, which corresponds to an electric field of 5 µV/cm."

Cautions: Evaluated Data
Digitized data were obtained from Figure 3 of the paper. Angle(c,H) is the angle between the directions of the applied magnetic field and the c-axis. Angle(c,H) = 0° means the direction of the field is parallel to the c-axis. For angle(c,H) = 90°, the field is perpendicular to the c-axis.