Material Specification for Bi:2223; [Bi-Sr-Ca-Cu-O]
Process: Evaporation
Notes: The authors cite A. Shah et al., Appl. Phys. Lett., Vol. 57, 1452 (1990), and summarize their procedure as follows. "The precursor solution is a stoichiometric, aqueous solution of nitrates of Bi, Sr, Ca, and Cu, with a concentration of 0.0575M based on calcium. The solution is ultrasonically atomized and injected into the plasma with oxygen as the carrier gas. The carrier gas flow rate is usually 3.7 L/min. In this case, the plasma is operated at atmospheric pressure between power levels of 4.5-5.0 kW. The plasma is sustained with a 1:1 argon-oxygen gas flow ratio and a total flow rate between 12-15 L/min. The MgO (100) single-crystal substrate, 12 x 5 mm in dimension, is mounted on a stainless-steel block, heated by four 150 W cartridge heaters. The heater block is heated to a temperature of 700-730 °C (depending on the required superconducting phase), as measured by a K-type thermocouple embedded in the block. As the block is immersed in the plasma, the temperature of the substrate rises further by about 100-150 °C. The droplet size of the atomized nitrate solution ranges from 1 µm to 4 µm, with the particle residue ranging from 0.1 µm to 0.3 µm. The aerosol is injected into the plasma where it evaporates and the vapor deposits on the substrate. The deposition is completed in 5-10 min. Film thickness is usually 0.05-0.2 µm. This is a deposition rate of about 100-200 σ/min. The aerosol injection is shut off after deposition and the film is further exposed to the argon-oxygen plasma for 3-5 min at the operating rf power levels. Subsequently, the film is naturally quenched down to room temperature in a flowing oxygen ambient of 3 L/min."
Formula: Bi2Sr2Ca2Cu3Ox
Informal Name: Bi:2223
Chemical Family: Bi-Sr-Ca-Cu-O
Chemical Class: Oxide
Structure Type: Polycrystalline
Manufacturer: In House
Commercial Name: In House
Production Date:
Lot Number:
Production Form: Thin Film
Critical Temperature for Bi:2223; [Bi-Sr-Ca-Cu-O]
| Substrate Temperature (°C) |
Critical Temperature (K) |
| 692 |
40 |
| 703 |
80 |
| 706 |
100 |
| 706 |
105 |
| 710 |
85 |
| 714 |
84 |
Measurement Method: Four-probe method
"The films are measured by the four point probe method across a 200 µm laser patterned bridge." No additional measurement details were noted.
Cautions: Evaluated Data
Digitized data were obtained from Figure 3 of the paper.
Critical Current Density for Bi:2223; [Bi-Sr-Ca-Cu-O]
| Temperature (°C) |
Critical Current Density (kA/cm2) |
| 77 |
100 |
Measurement Method: Four-probe method
"The films are measured by the four point probe method across a 200 µm laser patterned bridge." No additional measurement details were noted.
Cautions: Evaluated Data
Resistivity (normal state) for Bi:2223; [Bi-Sr-Ca-Cu-O]
| Temperature (°C) |
Resistivity (normal state) (mΩ·cm) |
| 104 |
0 |
| 108 |
0.4 |
| 115 |
0.8 |
| 148 |
1.2 |
| 212 |
1.8 |
| 300 |
2.5 |
Measurement Method: Four-probe method
"The films are measured by the four point probe method across a 200 µm laser patterned bridge." No additional measurement details were noted.
Cautions: Evaluated Data
Digitized data were obtained from Figure 1 of the paper.
