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NIST High Temp. Superconducting Materials (HTS) Database:

NIST Standard Reference Database 62

Last Update to Data Content: 1996

DOI: https://doi.org/10.18434/T4KP8J

Bibliographic Information

Title: Measurement of critical current (four-probe)
Author(s): Not Available
Publication: STA Project Data Volume: Not Available Issue: Not Available Year: 1990 Page(s): Not Available
Editor(s): Not Available
Publisher: Science and Technology Agency of Japan
Language: Japanese
Notes: STA sheet number: 1079-1086
Keywords: Material Specification, Critical Current Density

Materials and Properties

Y:123; [Y-Ba-Cu-O]
Y:123; [Y-Ba-Cu-O]
Y:123; [Y-Ba-Cu-O]
Material Specification for Y:123; [Y-Ba-Cu-O] Process:
Notes:
Formula: YBa2Cu3O6.9
Informal Name: Y:123
Chemical Family: Y-Ba-Cu-O
Chemical Class: Oxide
Structure Type:
Manufacturer:
Commercial Name:
Production Date:
Lot Number: BSK69Y
Production Form:

Critical Current Density for Y:123; [Y-Ba-Cu-O]
Electrical Field (µV/cm) Magnetic Field (T) Critical Current Density (kA/cm2)
1.0 0.0 0.118
1.0 0.1 0.0068
1.0 0.2 0.005
1.0 0.5 0.0032
1.0 1.0 0.0017
1.0 2.0 0.0013
1.0 4.0 0.00045
0.2 0.0 0.097
0.2 0.1 0.005
0.2 0.2 0.0032
0.2 0.5 0.0023
0.2 1.0 0.00068
Measurement Method: Resistivity (4-probe)
Test facility: Hitachi Research Laboratory, Hitachi, Ltd. Location: Central Lab., Hitachi Kenkyu-syo Start date: 3/13/94 Weekday: Monday Start time: 8:10 End date: 3/17/94 Weekday: Friday End time: 20:00 Environment temperature (avg): 15 °C Environment humidity (max): 60 % Test equipment: VSM; personal computer; printer; DC power source Specimen shape: thin film Specimen width: 2.2 mm Thickness: 1.1 mm Material of current electrode: indium ultrasonic wave solder Distance between current electrodes: 10 mm Material of voltage electrode: Ag paste Specimen treatment: being cut by a dry diamond cutter Electrode: Cu wire; Ag tape (0.5 mm x 5 mm) Test environment: liquid N2 Sweep rate: 10/3 A/min Field direction: sample current perpendicular to magnetic field (0T - 9 T) (sample wider face // magnetic field) Data comment: I-V characteristic Data derivation method: plotting a I-V curve based on the data obtained by PC Data definition: defining the current which induces 1 µV/cm as Ic

Cautions: Research Data
Material Specification for Y:123; [Y-Ba-Cu-O] Process:
Notes:
Formula: YBa2Cu3O6.9
Informal Name: Y:123
Chemical Family: Y-Ba-Cu-O
Chemical Class: Oxide
Structure Type:
Manufacturer:
Commercial Name:
Production Date:
Lot Number: BHK69Y
Production Form:

Critical Current Density for Y:123; [Y-Ba-Cu-O]
Electrical Field (µV/cm) Magnetic Field (T) Critical Current Density (kA/cm2)
1 0 0.088
1 0.1 0.0012
1 0.2 0.001
1 0.5 0.00066
1 1 0.00041
1 2 0.00017
0.2 0 0.07
0.2 0.1 0.00083
0.2 0.2 0.00062
0.2 0.5 0.00041
Measurement Method: Resistivity (4-probe)
Test facility: Hitachi Research Laboratory, Hitachi, Ltd. Location: Central Lab., Hitachi Kenkyu-syo Start date: 3/13/94 Weekday: Monday Start time: 8:10 End date: 3/17/94 Weekday: Friday End time: 20:00 Environment temperature (avg): 15 °C Environment humidity (max): 60 % Test equipment: VSM; personal computer; printer; DC power source Specimen shape: thin film Specimen width: 2.2 mm Thickness: 1.1 mm Material of current electrode: indium ultrasonic wave solder Distance between current electrodes: 10 mm Material of voltage electrode: Ag paste Specimen treatment: being cut by a dry diamond cutter Electrode: Cu wire; Ag tape (0.5 mm x 5 mm) Test environment: liquid N2 Sweep rate: 10/3 A/min Field direction: sample current perpendicular to magnetic field (0T - 9 T) (sample wider face // magnetic field) Data comment: I-V characteristic Data derivation method: plotting a I-V curve based on the data obtained by PC Data definition: defining the current which induces 1 µV/cm as Ic

Cautions: Research Data
Material Specification for Y:123; [Y-Ba-Cu-O] Process:
Notes:
Formula: YBa2Cu3O6.6
Informal Name: Y:123
Chemical Family: Y-Ba-Cu-O
Chemical Class: Oxide
Structure Type:
Manufacturer:
Commercial Name:
Production Date:
Lot Number: BHK66Y
Production Form:

Critical Current Density for Y:123; [Y-Ba-Cu-O]
Electrical Field (µV/cm) Magnetic Field (T) Critical Current Density (kA/cm2)
1 0 0.136
1 0.1 0.0058
1 0.2 0.0037
1 0.5 0.0018
1 1 0.00083
1 2 0.00038
0.2 0 0.123
0.2 0.1 0.005
0.2 0.2 0.0025
0.2 0.5 0.0013
0.2 1 0.00067
Measurement Method: Resistivity (4-probe)
Test facility: Hitachi Research Laboratory, Hitachi, Ltd. Location: Central Lab., Hitachi Kenkyu-syo Start date: 3/13/94 Weekday: Monday Start time: 8:10 End date: 3/17/94 Weekday: Friday End time: 20:00 Environment temperature (avg): 15 °C Environment humidity (max): 60 % Test equipment: VSM; personal computer; printer; DC power source Specimen shape: thin film Specimen width: 2.2 mm Thickness: 1.1 mm Material of current electrode: indium ultrasonic wave solder Distance between current electrodes: 10 mm Material of voltage electrode: Ag paste Specimen treatment: being cut by a dry diamond cutter Electrode: Cu wire; Ag tape (0.5 mm x 5 mm) Test environment: liquid N2 Sweep rate: 10/3 A/min Field direction: sample current perpendicular to magnetic field (0T - 9 T) (sample wider face // magnetic field) Data comment: I-V characteristic Data derivation method: plotting a I-V curve based on the data obtained by PC Data definition: defining the current which induces 1 µV/cm as Ic

Cautions: Research Data