Material Specification for Y:123; [Y-Ba-Cu-O]
Process:
Notes:
Formula: YBa2Cu3Ox
Informal Name: Y:123
Chemical Family: Y-Ba-Cu-O
Chemical Class: Oxide
Structure Type:
Manufacturer:
Commercial Name:
Production Date:
Lot Number: TFRYüi1üj
Production Form: Tape
Critical Current Density for Y:123; [Y-Ba-Cu-O]
Critical Current Density (kA/cm2) |
0.36 |
Measurement Method: Resistivity
Test facility: Toshiba Sogo Kenkyu-syo, Toshiba Energy-Kiki Kenkyu-syo
Location: laboratory
Start date: 1/13/94
End date: 1/13/94
Laboratory environment: air conditioned
Test equipment: stainless dewar (150 mm diameter), 30 A power source, sweeper, recorder
Maker of test equipment: Yokokawa Denki
Specimen history: putting in a desiccator which containing silica gel
Specimen size - width of thin film: 5.1 mm
Specimen size - length of thin film: 37.4 mm
Specimen size - thickness of thin film (avg): 0.29 mm
Specimen size: cross section area of thin film: 0.00225 cm
2
Remark on specimen: cut with a diamond cutter, four probes attached by ultrasonic soldering
Distance between current electrodes: 30.7 mm
Distance between voltage electrode: 9.3 mm
Specimen pre-treatment: no special
Specimen treatment: dried, and put in resin for cross section observation
Test environment: liquid N2
Test temperature (avg): 77.3 K
Sweep rate: 0.3 A/s
Applied field (avg): 0 T
Remark on test condition: measuring Ic in air; soaking the probe attached with sample into a liquid N2 cryostat; measuring I-V curve with 4-probe method
Current sweeping rate: 0.3 A/s; recording probe voltage with a recorder
Data derivation method: I-V curve from recorder
Data comment: defining the current which induced 1 µV/cm voltage between the voltage electrodes as Ic, Jc = Ic/S, S: cross section area of the bulk sample, S = 0.225 mm
2
Cautions: Research Data