NIST High Temp. Superconducting Materials (HTS) Database:

NIST Standard Reference Database 62

Last Update to Data Content: 1996

DOI: https://doi.org/10.18434/T4KP8J


Bibliographic Information

Title: Surface resistance
Author(s): Not Available
Publication: STA Project Data Volume: Not Available Issue: Not Available Year: 1990 Page(s): Not Available
Editor(s): Not Available
Publisher: Science and Technology Agency of Japan
Language: Japanese
Notes: STA sheet number: 1392
Keywords: Material Specification, Surface Resistance

Materials and Properties

Y:123; [Y-Ba-Cu-O]
Material Specification for Y:123; [Y-Ba-Cu-O] Process:
Notes:
Formula: YBa2Cu3O6.6
Informal Name: Y:123
Chemical Family: Y-Ba-Cu-O
Chemical Class: Oxide
Structure Type:
Manufacturer:
Commercial Name:
Production Date:
Lot Number: BDK66Y
Production Form:
Surface Resistance for Y:123; [Y-Ba-Cu-O]
Temperature (K) Surface Resistance (mΩ)
18.0 250
18.5 260
19.0 270
19.5 250
20.0 270
20.6 270
21.1 270
21.6 270
22.1 250
22.6 270
23.1 320
23.6 310
24.1 300
24.6 270
25.2 300
25.7 280
26.2 310
26.7 300
27.2 300
27.7 270
28.2 300
28.7 270
29.3 320
29.8 300
30.3 300
30.8 300
31.3 320
31.8 340
32.3 310
32.8 310
33.3 320
33.9 360
34.4 320
34.9 360
35.4 320
35.9 340
36.4 340
36.9 340
37.4 340
37.9 340
38.5 320
39.0 360
39.5 360
40.0 390
40.5 390
41.0 400
41.5 390
42.0 430
42.5 430
43.1 450
43.6 450
44.1 470
44.6 470
45.1 480
45.6 520
46.1 500
46.6 540
47.2 550
47.7 540
48.2 560
48.7 630
49.2 650
49.7 680
50.2 740
50.7 740
51.2 770
51.8 870
52.3 900
52.8 900
53.3 930
53.8 1010
54.3 1060
54.8 1170
55.3 1210
55.8 1250
56.4 1300
56.9 1410
57.4 1370
57.9 1510
58.4 1530
58.9 1500
59.4 1600
59.9 1700
60.5 1750
61.0 1800
61.5 1840
62.0 1880
62.5 1890
63.0 1890
63.5 1880
64.0 1920
64.5 1880
65.1 1900
65.6 1910
66.1 1920
66.6 1920
67.1 1910
67.6 1930
68.1 1910
68.6 1950
69.1 1910
69.7 1950
70.2 1950
70.7 1950
71.2 1930
71.7 1950
72.2 1950
72.7 1960
73.2 1970
73.7 1950
74.3 1950
74.8 1950
75.3 1990
75.8 1950
76.3 1940
76.8 1930
77.3 1950
77.8 1960
78.4 1970
78.9 1970
79.4 1970
79.9 1950
80.4 1950
80.9 1970
81.4 1970
81.9 1970
82.4 1950
83.0 1970
83.5 1970
84.0 1970
84.5 1970
85.0 1970
85.5 1970
86.0 1970
86.5 1940
87.0 1930
87.6 1950
88.1 1930
88.6 1950
89.1 1930
89.6 1970
90.1 1960
90.6 1950
91.1 1970
91.6 1960
92.2 1970
92.7 1950
93.2 1970
93.7 1970
94.2 1950
94.7 1950
95.2 1950
95.7 1950
96.3 1970
96.8 1910
97.3 1930
97.8 1910
98.3 1930
98.8 1930
99.3 1930
99.8 1930
100.3 1950
100.9 1950
101.4 1930
101.9 1950
102.4 1950
102.9 1970
103.4 1950
103.9 1970
104.4 1930
104.9 1930
105.5 1940
106.0 1950
106.5 1930
107.0 1930
107.5 1910
108.0 1910
108.5 1910
109.0 1930
109.6 1930
110.1 1930
110.6 1950
111.1 1950
111.6 1950
112.1 1930
112.6 1920
113.1 1930
113.6 1950
114.2 1960
114.7 1970
115.2 1930
115.7 1950
116.2 1970
116.7 1960
117.2 1930
117.7 1910
118.2 1930
118.8 1940
119.3 1950
119.8 1930
Measurement Method: Resistivity
Test facility: Faculty of Engineering, the University of Tokyo Location: Rm. 015, Bldg. 6, Faculty of Engineering Start date: 5/15/90 Weekday: Tuesday Start time: 21:29 End date: 5/16/90 Weekday: Wednesday End time: 11:20 Test equipment (1): synthesized sweeper Model of test equipment (1): HP8340B Test equipment (2): scalar network analyzer Model of test equipment (2): HP8757C Test equipment (3): cryostat Maker of test equipment (3): self-made Test equipment (4): cavity resonator Model of test equipment (4): TE112 Specimen shape: disk Specimen size: 5 mm Thickness: 0.2 mm Specimen holding: being put at the bottom of the cavity Test environment: thin He gas Test temperature: 20 K - 300 K Remark on test: measuring the blank temperature variation separately Data calculation: refer to Maeda, et al., Sogo Jikken-syo Nenho (1990) Data comment: measuring Q value - resonance wave number, calculating surface resistivity remark on data: floppy format HP basic LIF

Cautions: Research Data