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NIST High Temp. Superconducting Materials (HTS) Database:

NIST Standard Reference Database 62

Last Update to Data Content: 1996

DOI: https://doi.org/10.18434/T4KP8J

Bibliographic Information

Title: Contactless Measurement of Voltage-Current Characteristics of High-Tc Thin Film Superconductors
Author(s): M. Polak, V. Windte, W. Schauer, J. Reiner, A. Gurevich, and H. Wuhl
Publication: Physica C Volume: 174 Issue: Not Available Year: 1991 Page(s): 14-22
Editor(s): Not Available
Publisher: Elsevier Science Publishers B.V.
Language: English
Notes: Not Available
Keywords: Material Specification, Critical Current Density

Materials and Properties

Y:123; [Y-Ba-Cu-O]
Material Specification for Y:123; [Y-Ba-Cu-O] Process: Sputtering
Notes: The authors cite W. Schauer et al., Cryogenics, Vol. 30, 586 (1990), and summarize the procedure as follows. "Thin films of YBCO were prepared by hollow cathode magnetron sputtering from a cilindrical stoichiometric sinter target... Films were... deposited at a temperature of about 780 °C and subsequently cooled in (0.1 MPa = 1 bar) of oxygen. The deposition rate was about 2 σ/s. Polished (100) SrTiO3 substrates, 15 mm x 15 mm x 1 mm, were chosen..."
Formula: YBa2Cu3O7-x
Informal Name: Y:123
Chemical Family: Y-Ba-Cu-O
Chemical Class: Oxide
Structure Type:
Manufacturer: In House
Commercial Name: In House
Production Date:
Lot Number:
Production Form: Thin Film

Critical Current Density for Y:123; [Y-Ba-Cu-O]
Detection Criterion (µV/cm) Magnetic Field (mT) Critical Current Density (kA/cm2)
1 7.8 305
1 14.7 273
1 24.0 226
1 31.4 203
1 38.2 181
1 46.1 175
1 54.0 162
1 62.0 150
1 68.0 140
1 76.5 130
1 91.2 116
10-3 9.2 249
10-3 16.0 200
10-3 31.0 143
10-3 38.0 119
10-3 46.4 111
10-3 61.0 92
10-3 70.0 85
10-3 78.0 76
10-3 90.0 71
10-4 7.8 235
10-4 15.7 181
10-4 22.5 156
10-4 30.4 125
10-4 38.2 104
10-4 46.0 93
10-4 53.0 83
10-4 68.6 69
10-4 75.5 64
10-4 90.2 59
Measurement Method: Contactless inductive method
"... ring samples... (2R =2.75 mm, w=0.25 mm) were patterned. Material is removed from the substrate by directed argon ion milling using a photolithographically patterned resist as sputter mask... The external field... is produced by a solenoid wound from copper wire... The film sample is placed in the center of the solenoid with the film plane lying in the magnet midplane (z=0) and the ring axis being the solenoid axis (r=0). A Hall sensor with a small active ring area of approximately 50 µm x 50 µm can be positioned at some point (r,z) within the bore to detect the magnetic field... For the measurements the whole assembly; solenoid, film sample and Hall sensor, is immersed in liquid nitrogen."

Cautions: Evaluated Data
Digitized data were obtained from Figure 9 of the paper.