NIST High Temp. Superconducting Materials (HTS) Database:

NIST Standard Reference Database 62

Last Update to Data Content: 1996

DOI: https://doi.org/10.18434/T4KP8J


Bibliographic Information

Title: Anisotropy of Jc, H and Flux Pinning in c-axis Oriented Epitaxial YBa2Cu3O7 Thin Film
Author(s): B. Zhao, S. Kuroumaru, Y. Horie, E. Yanada, T. Aomine, X.Qiu, Y.Zhang, Y.Zhao, P.Xu, L.Li, H.Ohkubo, S. Mase
Publication: Physica C Volume: 176 Issue: Not Available Year: 1991 Page(s): 409-419
Editor(s): Not Available
Publisher: Elsevier Science Publishers B.V.
Language: English
Notes: Not Available
Keywords: Material Specification, Critical Field Strength Hc2

Materials and Properties

Y:123; [Y-Ba-Cu-O]
Material Specification for Y:123; [Y-Ba-Cu-O] Process: Sputtering
Notes: "The thin film was prepared by means of DC magnetron sputtering with a stoichiometric single phase target, and the substrate was a polished single crystal SrTiO3 (100). The sputtering conditions were as follows: sputtering gas pressure was (65-80 Pa = 5-6x10(-1) torr) with a ratio of O2:Ar=1:3, sputtering voltage was 110-120 V, substrate temperature is 800-820 °C, and the deposition rate is about 30 Σ/min. After deposition, the thin film was in situ annealed at 420-450 °C in an atmosphere of oxygen for about 20 min."
Formula: YBa2Cu3O7
Informal Name: Y:123
Chemical Family: Y-Ba-Cu-O
Chemical Class: Oxide
Structure Type: Polycrystalline
Manufacturer: In House
Commercial Name: In House
Production Date:
Lot Number:
Production Form: Thin Film
Critical Field Strength Hc2 for Y:123; [Y-Ba-Cu-O]
Configuration () Angle(H,C) (degrees) Angle(H,I) (degrees) Temperature (K) Crit.Mag.Field Strength Hc2 (MA/m)
A 90 0 82.0 12.0
A 90 0 82.5 9.0
A 90 0 82.9 7.0
A 90 0 83.4 5.0
A 90 0 83.8 3.0
A 90 0 84.2 1.1
A 90 0 84.5 0.0
A 90 30 81.6 12.1
A 90 30 82.2 9.0
A 90 30 83.3 5.0
A 90 30 84.2 1.0
A 90 30 84.4 0.0
A 90 45 81.5 12.1
A 90 45 82.1 9.0
A 90 45 83.1 5.0
A 90 45 84.2 1.0
A 90 45 84.4 0.0
A 90 60 81.3 12.1
A 90 60 82.0 9.0
A 90 60 83.0 5.0
A 90 60 84.2 1.0
A 90 60 84.4 0.0
A 90 90 81.1 12.0
A 90 90 82.0 9.0
A 90 90 82.5 7.0
A 90 90 83.0 5.0
A 90 90 84.1 1.0
A 90 90 84.4 0.0
B 0 90 74.2 12.1
B 0 90 76.6 9.2
B 0 90 78.2 7.1
B 0 90 79.7 5.0
B 0 90 81.8 2.5
B 0 90 83.1 1.1
B 0 90 84.3 0.1
B 30 90 75.4 12.1
B 30 90 77.3 9.0
B 30 90 78.6 7.1
B 30 90 80.0 5.0
B 30 90 83.2 1.1
B 30 90 84.3 0.1
B 45 90 76.2 12.0
B 45 90 78.1 9.0
B 45 90 79.4 7.0
B 45 90 80.5 5.1
B 45 90 81.9 3.0
B 45 90 82.8 2.0
B 45 90 83.5 1.1
B 45 90 84.5 0.1
B 60 90 77.8 12.1
B 60 90 79.4 9.1
B 60 90 80.2 7.0
B 60 90 81.5 5.0
B 60 90 82.4 3.0
B 60 90 83.1 2.2
B 60 90 83.7 1.2
B 60 90 84.0 0.6
B 60 90 84.4 0.1
B 90 90 82.0 12.0
B 90 90 82.5 9.1
B 90 90 82.9 7.0
B 90 90 83.6 5.0
B 90 90 83.9 3.2
B 90 90 84.2 1.1
B 90 90 84.4 0.6
B 90 90 84.5 0.3
C 0 90 74.3 12.0
C 0 90 76.7 9.0
C 0 90 78.3 7.0
C 0 90 79.9 5.0
C 0 90 81.8 2.5
C 0 90 83.4 1.0
C 0 90 84.4 0.0
C 30 90 75.3 12.0
C 30 90 77.2 9.1
C 30 90 78.8 7.0
C 30 90 80.0 5.1
C 30 90 81.6 3.0
C 30 90 82.4 2.1
C 30 90 83.5 1.0
C 30 90 84.4 0.0
C 45 90 76.2 12.0
C 45 90 78.1 9.0
C 45 90 79.3 7.0
C 45 90 80.5 5.0
C 45 90 82.0 3.0
C 45 90 82.8 2.0
C 45 90 83.6 1.0
C 45 90 84.5 0.1
C 60 90 77.7 12.0
C 60 90 79.3 9.1
C 60 90 80.2 7.0
C 60 90 81.5 5.0
C 60 90 82.3 3.0
C 60 90 83.1 2.1
C 60 90 83.5 1.0
C 60 90 83.9 0.5
C 60 90 84.4 0.0
C 90 90 81.4 12.0
C 90 90 82.2 9.1
C 90 90 82.5 7.0
C 90 90 83.1 5.0
C 90 90 83.9 2.0
C 90 90 84.0 1.0
C 90 90 84.4 0.2
C 90 90 84.5 0.0
Measurement Method: Four-probe method
The authors cite Y. Horie et al., Physica C, Vol. 170, 513 (1990), and summarize the procedure as follows. "... a microbridge, 50 µm wide and 150 µm long, was made and gold electrodes were deposited. From this designed pattern, the direction of measured current is always along the bridge. In order to get Jc, and H, the I-V curves and p-T curves at various (H,T) were measured by a standard four-probes method. The measurements were performed at three kinds of configurations... (A): H is applied perpendicularly to the c-axis (Angle(H,c) = 90), the angle... between H and I (Angle(H,I)) changes from 0°... to 180°... (B): H, I and the c-axis are in the same plane, and the angle... between H and the c-axis changes from 0°... to 90°... (C): H is applied perpendicularly to I, and the angle... between H and c-axis changes from 0°... to 90°... Hc2 is determined at the middle point of the resistive transition..."

Cautions: Evaluated Data
Digitized data were obtained from Figure 2a,b, and c of the paper. Angle(H,c) = the angle between the directions of the applied field and the c axis. Angle(H,I) = the angle between the directions of the applied field and the electrical current.