NIST X-ray Photoelectron Spectroscopy Database

NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

Details Summary:

Tab Page Summary

General:

Element:

Formula:

(^-CH₂C(CH₃)(C(O)OCH₃)^-)n

XPS Formula:

(^-C(CH₃)(C(O*)^-O^-CH₃)^-CH₂^-)n

Name:

poly(methyl methacrylate)

CAS Registry No:

9011-14-7

Class:

ester, oxygen, polymer, sulfur

Citation:

Author Name(s):

Sleigh C., Pijpers A.P., Jaspers A., Coussens B., Meier R.J.

Journal:

J. Electron Spectrosc. Relat. Phenom. 77, 41

DOI:

Pub Year:

1996

book All Records in this Publication

Data Processing:

Photoelectron Line

532.01

Background Subtraction Method:

Peak Location Method:

data

Full Width at Half-maximum Intensity (eV):

Gaussian Width (eV):

Lorentzian Width (eV):

Measurement:

Use of X-ray Monochromator:

Anode Material:

Al/Mg

X-ray Energy:

Overall Energy Resolution (eV):

Calibration:

Au,Ag,Cu = 84.00,368.27,932.67

Charge Reference:

Internal hydrocarbon

Energy Scale Evaluation:

Reliable (reported energy within 300 eV of a reference energy)

Comment:

Specimen:

Method of Determining Specimen Composition:

Method of Determining Specimen Crystallinity:

Specimen Temperature (K):

300