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NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0
Reliable (reported energy within 300 eV of a reference energy)
Comment:
~ 100 nm C60 were grown by thermal evaporation on Si(111) at 333 K. The substrate was HF etched immediately prior to film growth. FAT mode. The spectra were recorded at normal emission. The intensity ratio of the Gaussian/Lorentzian components was 70/30.