NIST X-ray Photoelectron Spectroscopy Database

NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

Details Summary:

Tab Page Summary

General:

silicon

7440-21-3

element, II-VI semiconductor, IV semiconductor

Citation:

Author Name(s):

Ley L., Wang Y., Van V.N., Fisson S., Souche D., Vuye G., et al.

Journal:

Thin Solid Films 270, 561

DOI:

Pub Year:

1995

book All Records in this Publication

Data Processing:

Data Type:

Doublet Separation for Photoelectron Lines

Line Designation:

DS-2p

Double Separation (eV)

0.60

Energy Uncertainty:

Background Subtraction Method:

Shirley

Peak Location Method:

Gaussian

Full Width at Half-maximum Intensity (eV):

Gaussian Width (eV):

Lorentzian Width (eV):

Measurement:

Use of X-ray Monochromator:

Anode Material:

X-ray Energy:

Overall Energy Resolution (eV):

0.8

Calibration:

Pt4f7 = 71.12

Charge Reference:

Conductor

Energy Scale Evaluation:

Reliable, with one-point correction of energy scale

Comment:

Branching ratio = 0.5

Specimen:

Method of Determining Specimen Composition:

Method of Determining Specimen Crystallinity:

Specimen Temperature (K):

300