Reliable (reported energy within 300 eV of a reference energy)
Comment:
2 ML Fe were deposited onto Si(100)-(2x1) and annealed (T = 630 K, time = 20 min). The substrate was cleaned by Ar+ ion bombardment and rapid thermal annealing by electron beam heating ( T = 1500 - 1600 K). rapid thermal annealing by electron beam heating ( T = 1500 - 1600 K).