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NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

Details Summary:
Summary Page
Tab Page Summary

General:
Element:
Si
Formula:
XeF2/Si
XPS Formula:
bulk and surface states
Name:
xenon difluoride/silicon
CAS Registry No:
7440-21-3
Class:
element, fluoride

Citation:
Author Name(s):
Simpson W.C., Yarmoff J.A., Hung W.H., McFeely F.R.
Journal:
Surf. Sci. 355, L283
DOI:
Pub Year:
1996

Data Processing:
Data Type:
Doublet Separation for Photoelectron Lines
Line Designation:
DS-2p
Double Separation (eV)
0.60
Energy Uncertainty:
Background Subtraction Method:
other
Peak Location Method:
mixed Gaussian/Lorentzian
Full Width at Half-maximum Intensity (eV):
Gaussian Width (eV):
Lorentzian Width (eV):

Measurement:
Use of X-ray Monochromator:
No
Anode Material:
other source
X-ray Energy:
170
Overall Energy Resolution (eV):
Calibration:
Charge Reference:
Element
Energy Scale Evaluation:
Reliable (reported energy within 300 eV of a reference energy)
Comment:
40 L XeF2/Si(111)-(7x7). The surface was lightly annealed to remove higher fluorides. Branching ratio = 0.50. The intensity ratio of the surface/bulk components was 0.16.

Specimen:
Specimen:
Method of Determining Specimen Composition:
Method of Determining Specimen Crystallinity:
Specimen Temperature (K):
300
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