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NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

Details Summary:
Summary Page
Tab Page Summary

General:
Element:
C
Formula:
HC(O)OH/O2/Cu
XPS Formula:
HC*(O)OH/O2/Cu
Name:
formic acid/oxygen/copper
CAS Registry No:
64-18-6
Class:
carboxylic acid, hydroxyl(organic), organic acid, oxygen

Citation:
Author Name(s):
Ayyoob M., Hegde M.S.
Journal:
J. Chem. Soc. Faraday Trans. I 82, 1651
DOI:
Pub Year:
1986

Data Processing:
Data Type:
Photoelectron Line
Line Designation:
1s
Binding Energy (eV)
287.50
Energy Uncertainty:
Background Subtraction Method:
Peak Location Method:
data
Full Width at Half-maximum Intensity (eV):
Gaussian Width (eV):
Lorentzian Width (eV):

Measurement:
Use of X-ray Monochromator:
No
Anode Material:
Mg
X-ray Energy:
Overall Energy Resolution (eV):
Calibration:
Ag3d5 = 368.27
Charge Reference:
Conductor
Energy Scale Evaluation:
Reliable, with one-point correction of energy scale
Comment:
1E2 L HCOOH/1E3 L O2/Cu

Specimen:
Specimen:
Method of Determining Specimen Composition:
Method of Determining Specimen Crystallinity:
Specimen Temperature (K):
300
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