NIST X-ray Photoelectron Spectroscopy Database

NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

Details Summary:

Tab Page Summary

General:

Element:

Formula:

CH₃(C₂H₅O)CHO(CH₂)₅O^-(CH₂CH₂O)x^-H

XPS Formula:

C atom in ^-CH₃, =CH₂, =CH^- groups

Name:

acetal masked polyether

CAS Registry No:

Class:

ether, oxygen, polymer

Citation:

Author Name(s):

Wagener K., Batich C., Kirsch B., Wanigatunga S.

Journal:

J. Polym. Sci. Part A 27, 2625

DOI:

Pub Year:

1989

book All Records in this Publication

Data Processing:

Photoelectron Line

284.80

Background Subtraction Method:

Peak Location Method:

other type of curve fit

Full Width at Half-maximum Intensity (eV):

Gaussian Width (eV):

Lorentzian Width (eV):

Measurement:

Use of X-ray Monochromator:

Anode Material:

X-ray Energy:

Overall Energy Resolution (eV):

Calibration:

Charge Reference:

Internal hydrocarbon

Energy Scale Evaluation:

Reliable, with one-point correction of energy scale

Comment:

Samples were solvent cast (using methylene chloride) on an Al foil previously chloride) on an Al foil previously cleaned with absolute ethanol.

Specimen:

Method of Determining Specimen Composition:

Method of Determining Specimen Crystallinity:

Specimen Temperature (K):

300