NIST X-ray Photoelectron Spectroscopy Database

NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

Details Summary:

Tab Page Summary

General:

SiO₂,quartz

Si*O₂

silicon(IV) dioxide (Quartz)

CAS Registry No:

60676-86-0

Class:

glass, IV semiconductor, IV-VI semiconductor, mineral, oxide, silicate

Citation:

Author Name(s):

Bender H., Chen W., Portillo J., Van den Hove L., Wandervorst W.

Journal:

Appl. Surf. Sci. 38, 37

DOI:

Pub Year:

1989

book All Records in this Publication

Data Processing:

Photoelectron Line

2p_3/2

103.70

Background Subtraction Method:

Peak Location Method:

data

Full Width at Half-maximum Intensity (eV):

Gaussian Width (eV):

Lorentzian Width (eV):

Measurement:

Use of X-ray Monochromator:

Anode Material:

X-ray Energy:

Overall Energy Resolution (eV):

Calibration:

Charge Reference:

Adventitious carbon

Energy Scale Evaluation:

Reliable, with one-point correction of energy scale

Comment:

Si(100), thickness is 100 nm.

Specimen:

Method of Determining Specimen Composition:

Method of Determining Specimen Crystallinity:

Specimen Temperature (K):

300