NIST X-ray Photoelectron Spectroscopy Database

NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

Details Summary:

Tab Page Summary

General:

Element:

Formula:

Si₁^-xGex:H

Name:

germanium hydrogen silicon alloy

CAS Registry No:

Class:

alloy, IV-VI semiconductor

Citation:

Author Name(s):

Cardinaud C., Senemaud C., Villela G.

Journal:

J. Non-cryst. Solids 88, 55

DOI:

Pub Year:

1986

book All Records in this Publication

Data Processing:

Photoelectron Line

2p_3/2

99.40

Background Subtraction Method:

Peak Location Method:

data

Full Width at Half-maximum Intensity (eV):

Gaussian Width (eV):

Lorentzian Width (eV):

Measurement:

Use of X-ray Monochromator:

Anode Material:

X-ray Energy:

Overall Energy Resolution (eV):

Calibration:

Au4f7 = 84.00

Charge Reference:

Conductor

Energy Scale Evaluation:

Reliable, with one-point correction of energy scale

Comment:

a-Si1-xGex;H, where x=0.2, 0.3, and 0.4 are volume fractions. Hydrogen concentrations are 11-12% for low x values and 9% for x about 0.38.

Specimen:

Method of Determining Specimen Composition:

Method of Determining Specimen Crystallinity:

Specimen Temperature (K):

300