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NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

Details Summary:
Summary Page
Tab Page Summary

General:
Element:
Ge
Formula:
Si1-xGex:H
Name:
germanium hydrogen silicon alloy
CAS Registry No:
Class:
alloy, IV-VI semiconductor

Citation:
Author Name(s):
Cardinaud C., Senemaud C., Villela G.
Journal:
J. Non-cryst. Solids 88, 55
DOI:
Pub Year:
1986

Data Processing:
Data Type:
Photoelectron Line
Line Designation:
3d
Binding Energy (eV)
29.40
Energy Uncertainty:
Background Subtraction Method:
Peak Location Method:
data
Full Width at Half-maximum Intensity (eV):
Gaussian Width (eV):
Lorentzian Width (eV):

Measurement:
Use of X-ray Monochromator:
No
Anode Material:
Al
X-ray Energy:
Overall Energy Resolution (eV):
Calibration:
Au4f7 = 84.00
Charge Reference:
Conductor
Energy Scale Evaluation:
Reliable, with one-point correction of energy scale
Comment:
a-Si1-xGex;H, where x=0.2, 0.3, and 0.4 are volume fractions. Hydrogen concentrations are 11-12% for low x values and 9% for x about 0.38.

Specimen:
Specimen:
Method of Determining Specimen Composition:
Method of Determining Specimen Crystallinity:
Specimen Temperature (K):
300
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