There was a problem with the connection!

NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

Details Summary:
Summary Page
Tab Page Summary

General:
Element:
S
Formula:
(-CH2((CH2)4)CH2S(O)(O)-)n
XPS Formula:
(-CH2((CH2)4)CH2S*(O)(O)-)n
Name:
poly(hexamethylene sulfone)
CAS Registry No:
Class:
polymer, sulfur

Citation:
Author Name(s):
Beamson G., Briggs D.
Journal:
High Resolution XPS of Organic Polymers: the Scienta ESCA300 Database
DOI:
Pub Year:
1993

Data Processing:
Data Type:
Photoelectron Line
Line Designation:
2p3/2
Binding Energy (eV)
167.64
Energy Uncertainty:
Background Subtraction Method:
Peak Location Method:
Full Width at Half-maximum Intensity (eV):
Gaussian Width (eV):
Lorentzian Width (eV):

Measurement:
Use of X-ray Monochromator:
No
Anode Material:
X-ray Energy:
Overall Energy Resolution (eV):
Calibration:
Charge Reference:
PC
Energy Scale Evaluation:
Comment:

Specimen:
Specimen:
Method of Determining Specimen Composition:
Method of Determining Specimen Crystallinity:
Specimen Temperature (K):
An error has occurred. This application may no longer respond until reloaded. Reload 🗙