There was a problem with the connection!

NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

Details Summary:
Summary Page
Tab Page Summary

General:
Element:
Si
Formula:
SiO2
XPS Formula:
SiO2
Name:
silicon dioxide
CAS Registry No:
7631-86-9
Class:
anhydride, catalyst, glass, IV semiconductor, IV-VI semiconductor, mineral, oxide

Citation:
Author Name(s):
Paparazzo E.
Journal:
J. Phys. D. 20, 1091
DOI:
Pub Year:
1987

Data Processing:
Data Type:
Photoelectron Line
Line Designation:
2s
Binding Energy (eV)
154.60
Energy Uncertainty:
Background Subtraction Method:
Peak Location Method:
data
Full Width at Half-maximum Intensity (eV):
Gaussian Width (eV):
Lorentzian Width (eV):

Measurement:
Use of X-ray Monochromator:
No
Anode Material:
Al
X-ray Energy:
Overall Energy Resolution (eV):
Calibration:
Charge Reference:
Adventitious carbon
Energy Scale Evaluation:
Reliable, with one-point correction of energy scale
Comment:
The composition determined by XPS is SiO2.08.

Specimen:
Specimen:
Method of Determining Specimen Composition:
X-ray Photoelectron Spectroscopy
Method of Determining Specimen Crystallinity:
Specimen Temperature (K):
300
An error has occurred. This application may no longer respond until reloaded. Reload 🗙