NIST X-ray Photoelectron Spectroscopy Database

NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

Details Summary:

Tab Page Summary

General:

S

CH₃SC₆H₄O(CH₂)₁₁SiCl₃/Si

CH₃SC₆H₄O(CH₂)₁₁SiCl₃/Si

11-[4-(methylthio)phenoxy]-1-(trichlorosilyl) undecane/silicon

CAS Registry No:

ether, organometallic, oxygen, phenyl benzene, sulfur

Citation:

Author Name(s):

Tillman N., Ulman A., Elman J.F.

Langmuir 5, 1020

Pub Year:

1989

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Total Records: 2

Data Processing:

Photoelectron Line

Line Designation:

2p_3/2

Binding Energy (eV)

163.48

Energy Uncertainty:

Background Subtraction Method:

Peak Location Method:

data

Full Width at Half-maximum Intensity (eV):

Gaussian Width (eV):

Lorentzian Width (eV):

Measurement:

Use of X-ray Monochromator:

Yes

Anode Material:

Al

X-ray Energy:

Overall Energy Resolution (eV):

Calibration:

Charge Reference:

Internal hydrocarbon

Energy Scale Evaluation:

Reliable, with one-point correction of energy scale

Comment:

Self-assembled monolayer film.

Specimen:

Method of Determining Specimen Composition:

Method of Determining Specimen Crystallinity:

Specimen Temperature (K):

300

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