NIST X-ray Photoelectron Spectroscopy Database

NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

Details Summary:

Tab Page Summary

General:

Element:

Formula:

(^-OCH₂CH(CH₂O(CH₂)₃Si(OCH₃)₃)^-)n

XPS Formula:

silicon atoms in Si^-O groups

Name:

poly(3-glycidoxypropyltrimethoxysilane)

CAS Registry No:

Class:

organometallic, oxygen, polymer, silane, surface polymer

Citation:

Author Name(s):

Laoharojanaphand P., Lin T.J., Stoffer J.O.

Journal:

J. Appl. Polymer Sci. 40, 369

DOI:

Pub Year:

1990

book All Records in this Publication

Data Processing:

Photoelectron Line

102.40

Background Subtraction Method:

other

Peak Location Method:

Gaussian

Full Width at Half-maximum Intensity (eV):

Gaussian Width (eV):

Lorentzian Width (eV):

Measurement:

Use of X-ray Monochromator:

Anode Material:

X-ray Energy:

Overall Energy Resolution (eV):

Calibration:

Au4f7 = 84.00

Charge Reference:

Internal hydrocarbon

Energy Scale Evaluation:

Reliable, with one-point correction of energy scale

Comment:

Specimen:

Method of Determining Specimen Composition:

Method of Determining Specimen Crystallinity:

Specimen Temperature (K):

293