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NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

Details Summary:
Summary Page
Tab Page Summary

General:
Element:
Si
Formula:
NO/Si
XPS Formula:
SiOxNy
Name:
nitrogen oxide/silicon
CAS Registry No:
7440-21-3
Class:
element, IV semiconductor, nitride, non-stoichiometric oxide, oxide

Citation:
Author Name(s):
Glachant A., Soukiassian P., Mangat P.S., Peng J., Kim S.T.
Journal:
Appl. Surf. Sci. 56, 802
DOI:
Pub Year:
1992

Data Processing:
Data Type:
Chemical Shift
Line Designation:
CS-2p3/2
Chemical Shift (eV)
2.55
Energy Uncertainty:
0.05
Background Subtraction Method:
other
Peak Location Method:
data
Full Width at Half-maximum Intensity (eV):
1.99
Gaussian Width (eV):
Lorentzian Width (eV):

Measurement:
Use of X-ray Monochromator:
Yes
Anode Material:
other source
X-ray Energy:
130
Overall Energy Resolution (eV):
0.4
Calibration:
Si2p=99.34
Charge Reference:
Conductor
Energy Scale Evaluation:
Reliable, with one-point correction of energy scale
Comment:
1E3 L NO/Si.

Specimen:
Specimen:
Method of Determining Specimen Composition:
Method of Determining Specimen Crystallinity:
Specimen Temperature (K):
300
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