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NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0
Reliable (reported energy within 300 eV of a reference energy)
Comment:
2 -100 A Ti/Si(111)-(7x7). The substrate was chemically etched, Ar+ ion sputtered, and annealed (T = 1273 K). The spectra were recorded at normal emission. Branching ratio = 0.52. monitor. The intensity ratio of the Gaussian/Lorentzian components was 70/3