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NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

Details Summary:
Summary Page
Tab Page Summary

General:
Element:
Si
Formula:
Ti/Si
XPS Formula:
solid solution phase of Si in Ti
Name:
titanium/silicon
CAS Registry No:
7440-21-3
Class:
element, silicide, solid solution

Citation:
Author Name(s):
Chambers S.A., Hill D.M., Xu F., Weaver J.H.
Journal:
Phys. Rev. B 35, 634
DOI:
Pub Year:
1987

Data Processing:
Data Type:
Interface Core-Level Shift
Line Designation:
INT-2p3/2
Interface Core-Level Shift
-1.10
Energy Uncertainty:
Background Subtraction Method:
other
Peak Location Method:
mixed Gaussian/Lorentzian
Full Width at Half-maximum Intensity (eV):
Gaussian Width (eV):
Lorentzian Width (eV):

Measurement:
Use of X-ray Monochromator:
No
Anode Material:
Al
X-ray Energy:
Overall Energy Resolution (eV):
Calibration:
Charge Reference:
Element
Energy Scale Evaluation:
Reliable (reported energy within 300 eV of a reference energy)
Comment:
7 - 100 A Ti/Si(111)-(7x7). The substrate was chemically etched, Ar+ ion sputtered, and annealed (T = 1273 K). Branching ratio = 0.52. The total FWHM is 0.45 eV. The spectra were recorded at normal emission. The intensity ratio of the Gaussian/Lorentzian

Specimen:
Specimen:
Method of Determining Specimen Composition:
Method of Determining Specimen Crystallinity:
Specimen Temperature (K):
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