NIST X-ray Photoelectron Spectroscopy Database

NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

Details Summary:

Tab Page Summary

General:

Si

Si/(^-O)₃Si(CH₂)₃NHC(O)(CH₂)₇C(O)OCH₃

(^-O)₃Si(CH₂)₃NHC(O)(CH₂)₇C(O)OCH₃/Si*

silicon/methyl 9-oxo-9-(propylamino)nonanoate covalently bonded to oxidized silicon

CAS Registry No:

7440-21-3

amide, ester, nitrogen, organometallic, oxygen

Citation:

Author Name(s):

Kallury K.M.R., Debono R.F., Krull U.J., Thompson M.

J. Adhesion Sci. Technol. 5, 801

Pub Year:

1991

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Total Records: 35

Element

Atomic No

Formula

Spectral Line

Energy (eV)

Details

C

6

(^-O)₃Si(CH₂)₃NHC(O)(CH₂)₁₆CH₃/Si

1s

284.80

C

6

(^-O)₃Si(CH₂)₃NHC(O)(CH₂)₁₆CH₃/Si

1s

286.30

C

6

(^-O)₃Si(CH₂)₃NHC(O)(CH₂)₁₆CH₃/Si

1s

288.30

N

7

(^-O)₃Si(CH₂)₃NHC(O)(CH₂)₁₆CH₃/Si

1s

399.90

N

7

(^-O)₃Si(CH₂)₃NHC(O)(CH₂)₁₆CH₃/Si

1s

401.70

Si

14

(^-O)₃Si(CH₂)₃NHC(O)(CH₂)₁₆CH₃/Si

2p

98.90

Si

14

(^-O)₃Si(CH₂)₃NHC(O)(CH₂)₁₆CH₃/Si

2p

102.90

C

6

(^-O)₃Si(CH₂)₃NHC(O)(CH₂)₇C(O)OCH₃/Si

1s

284.80

C

6

(^-O)₃Si(CH₂)₃NHC(O)(CH₂)₇C(O)OCH₃/Si

1s

286.30

C

6

(^-O)₃Si(CH₂)₃NHC(O)(CH₂)₇C(O)OCH₃/Si

1s

288.20

N

7

(^-O)₃Si(CH₂)₃NHC(O)(CH₂)₇C(O)OCH₃/Si

1s

399.60

N

7

(^-O)₃Si(CH₂)₃NHC(O)(CH₂)₇C(O)OCH₃/Si

1s

401.60

Si

14

Si/(^-O)₃Si(CH₂)₃NHC(O)(CH₂)₇C(O)OCH₃

2p

99.00

Si

14

(^-O)₃Si(CH₂)₃NHC(O)(CH₂)₇C(O)OCH₃/Si

2p

102.70

C

6

(^-O)₃Si(CH₂)₃NHC(O)(CH₂)₇C(O)OH/Si

1s

284.80

C

6

(^-O)₃Si(CH₂)₃NHC(O)(CH₂)₇C(O)OH/Si

1s

286.20

C

6

(^-O)₃Si(CH₂)₃NHC(O)(CH₂)₇C(O)OH/Si

1s

288.00

N

7

(^-O)₃Si(CH₂)₃NHC(O)(CH₂)₇C(O)OH/Si

1s

399.70

N

7

(^-O)₃Si(CH₂)₃NHC(O)(CH₂)₇C(O)OH/Si

1s

401.60

Si

14

(^-O)₃Si(CH₂)₃NHC(O)(CH₂)₇C(O)OH/Si

2p

98.60

Si

14

(^-O)₃Si(CH₂)₃NHC(O)(CH₂)₇C(O)OH/Si

2p

102.70

C

6

(^-O)₃Si(CH₂)₃NHC(O)(CH₂)₁₁NO₂/Si

1s

284.80

C

6

(^-O)₃Si(CH₂)₃NHC(O)(CH₂)₁₁NO₂/Si

1s

286.30

C

6

(^-O)₃Si(CH₂)₃NHC(O)(CH₂)₁₁NO₂/Si

1s

287.90

N

7

(^-O)₃Si(CH₂)₃NHC(O)(CH₂)₁₁NO₂/Si

1s

406.20

N

7

(^-O)₃Si(CH₂)₃NHC(O)(CH₂)₁₁NO₂/Si

1s

399.90

Si

14

Si/(^-O)₃Si(CH₂)₃NHC(O)(CH₂)₁₁NO₂

2p

98.90

Si

14

(^-O)₃Si(CH₂)₃NHC(O)(CH₂)₁₁NO₂/Si

2p

102.70

C

6

(^-O)₃Si(CH₂)₃NHC(O)(CH₂)₁₁NH₂/Si

1s

284.80

C

6

(^-O)₃Si(CH₂)₃NHC(O)(CH₂)₁₁NH₂/Si

1s

286.20

Data Processing:

Photoelectron Line

Line Designation:

2p

Binding Energy (eV)

99.00

Energy Uncertainty:

Background Subtraction Method:

other

Peak Location Method:

Gaussian

Full Width at Half-maximum Intensity (eV):

Gaussian Width (eV):

Lorentzian Width (eV):

Measurement:

Use of X-ray Monochromator:

No

Anode Material:

Mg

X-ray Energy:

Overall Energy Resolution (eV):

Calibration:

Charge Reference:

Internal hydrocarbon

Energy Scale Evaluation:

Reliable, with one-point correction of energy scale

Comment:

The thickness of the film determined by ellipsometry is 27+-2 A. The relative intensity was 0.14. The spectra were recorded at normal emission.

Specimen:

Method of Determining Specimen Composition:

Method of Determining Specimen Crystallinity:

Specimen Temperature (K):

300

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