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NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

Details Summary:
Summary Page
Tab Page Summary

General:
Element:
O
Formula:
SiO2
Name:
silicon dioxide
CAS Registry No:
7631-86-9
Class:
anhydride, catalyst, glass, IV semiconductor, IV-VI semiconductor, mineral, oxide

Citation:
Author Name(s):
Sprenger D., Bach H., Meisel W., Gutlich P.
Journal:
J. Non-cryst. Solids 126, 111
DOI:
Pub Year:
1990

Data Processing:
Data Type:
Photoelectron Line
Line Designation:
1s
Binding Energy (eV)
532.10
Energy Uncertainty:
Background Subtraction Method:
Shirley
Peak Location Method:
mixed Gaussian/Lorentzian
Full Width at Half-maximum Intensity (eV):
1.25
Gaussian Width (eV):
Lorentzian Width (eV):

Measurement:
Use of X-ray Monochromator:
No
Anode Material:
Mg
X-ray Energy:
Overall Energy Resolution (eV):
Calibration:
Au4f7 = 84.00
Charge Reference:
Adventitious carbon
Energy Scale Evaluation:
Reliable, with one-point correction of energy scale
Comment:
Herasil, pure quartz glass. The sample was broken under UHV. The intensity ratio of the Gaussian/Lorentzian components was 0.99. The total FWHM is 1.25.

Specimen:
Specimen:
Method of Determining Specimen Composition:
Method of Determining Specimen Crystallinity:
Specimen Temperature (K):
300
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