NIST X-ray Photoelectron Spectroscopy Database

NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

Details Summary:

Tab Page Summary

General:

Element:

Formula:

((CH₃)₄N)₂[W₂O₂S₂(S₂)(S₄)]

Name:

bis(tetramethylammonium) bis-mu-thio-dipolysulfido-tetrapolysulfido-bis(oxotungstate)

CAS Registry No:

Class:

catalyst, nitrogen, organometallic, oxygen ligand, sulfide, sulfur ligand

Citation:

Author Name(s):

Bhattacharyya R., Chakrabarty P.K., Ghosh P.N., Mukherjee A.K., Podder D., and Mukherjee M.

Journal:

Inorg. Chem. 30, 3948

DOI:

Pub Year:

1991

book All Records in this Publication

Data Processing:

Photoelectron Line

402.00

Background Subtraction Method:

Peak Location Method:

data

Full Width at Half-maximum Intensity (eV):

Gaussian Width (eV):

Lorentzian Width (eV):

Measurement:

Use of X-ray Monochromator:

Anode Material:

X-ray Energy:

Overall Energy Resolution (eV):

Calibration:

Charge Reference:

Adventitious carbon

Energy Scale Evaluation:

Reliable, with one-point correction of energy scale

Comment:

Specimen:

Method of Determining Specimen Composition:

Method of Determining Specimen Crystallinity:

X-ray Diffraction

Specimen Temperature (K):

300