NIST X-ray Photoelectron Spectroscopy Database

NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

Details Summary:

Tab Page Summary

General:

NiS

nickel sulfide

16812-54-7

chalcogenide, II-VI semiconductor, sulfide

Citation:

Author Name(s):

Matoba M., Anzai S., Fujimori A.

Journal:

J. Phys. Soc. Japan 60, 4230

DOI:

Pub Year:

1991

book All Records in this Publication

Data Processing:

Photoelectron Line

2p_3/2

162.04

0.05

Background Subtraction Method:

other

Peak Location Method:

mixed Gaussian/Lorentzian

Full Width at Half-maximum Intensity (eV):

Gaussian Width (eV):

0.93

Lorentzian Width (eV):

2.16

Measurement:

Use of X-ray Monochromator:

Anode Material:

X-ray Energy:

Overall Energy Resolution (eV):

Calibration:

Au4f7 = 84.00

Charge Reference:

Conductor

Energy Scale Evaluation:

Reliable (reported energy within 300 eV of a reference energy)

Comment:

The sample was cleaned by Ar+ ion bombardment (Ep = 0.5 keV, time = 1 min, normal incidence). Asymmetry parameter = 0.01. Branching ratio = 0.5.

Specimen:

Method of Determining Specimen Composition:

Method of Determining Specimen Crystallinity:

Specimen Temperature (K):

300