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NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

Details Summary:
Summary Page
Tab Page Summary

General:
Element:
O
Formula:
(-C6H4C(CH3)2C6H4OC6H4S(O)2C6H4O-)n
XPS Formula:
(-C6H4C(CH3)2C6H4O*C6H4S(O)2C6H4O*-)n
Name:
poly(sulfone)
CAS Registry No:
25135-51-7
Class:
ether, oxygen, phenyl benzene, polymer, sulfonyl, sulfur

Citation:
Author Name(s):
Pertsin A.J., Gorelova M.M., Levin V.Y., Makarova L.I.
Journal:
J. Appl. Polymer Sci. 45, 1195
DOI:
Pub Year:
1992

Data Processing:
Data Type:
Photoelectron Line
Line Designation:
1s
Binding Energy (eV)
531.90
Energy Uncertainty:
Background Subtraction Method:
other
Peak Location Method:
Gaussian
Full Width at Half-maximum Intensity (eV):
Gaussian Width (eV):
Lorentzian Width (eV):

Measurement:
Use of X-ray Monochromator:
No
Anode Material:
Mg
X-ray Energy:
Overall Energy Resolution (eV):
Calibration:
Au,Ag,Cu = 84.00,368.27,932.67
Charge Reference:
Internal hydrocarbon
Energy Scale Evaluation:
Reliable, with one-point correction of energy scale
Comment:
The composition determined by XPS was C0.88O0.10S0.04. FRR mode. The fitting was done in accordance with the stoichiometry. The relative intensity was 0.5. No x-ray induced damage to the sample was detected during analysis.

Specimen:
Specimen:
Method of Determining Specimen Composition:
X-ray Photoelectron Spectroscopy
Method of Determining Specimen Crystallinity:
Specimen Temperature (K):
300
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