Reliable (reported energy within 300 eV of a reference energy)
Comment:
0.45 ML Cl2/GaAs0.96(110). The Cl2 molecular beam with Ep = 0.14 eV was directed toward the surface at an incident angle of 60 degrees. The GaAs(110) wafer was initially degreased and wet etched in H2SO4:H2O2:H2O (5:1:1). Emission angle = 50 degrees.