NIST X-ray Photoelectron Spectroscopy Database

NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

Details Summary:

Tab Page Summary

General:

Element:

Formula:

Cu/(^-C₄HS((CH₂)₅CH₃)^-)n

XPS Formula:

sulfur atoms of pure poly(₃^-hexylthophene)

Name:

copper/poly(3-hexylthiophene)

CAS Registry No:

104934-50-1

Class:

organometallic, other ring, polymer, sulfur, thiol

Citation:

Author Name(s):

Lachkar A., Selmani A., Sacher E., Leclerc M., Mokhliss R.

Journal:

Synthetic Metals 66, 209

DOI:

Pub Year:

1994

book All Records in this Publication

Data Processing:

Photoelectron Line

2p_1/2

165.10

0.1

Background Subtraction Method:

Shirley

Peak Location Method:

other type of curve fit

Full Width at Half-maximum Intensity (eV):

1.3

Gaussian Width (eV):

Lorentzian Width (eV):

Measurement:

Use of X-ray Monochromator:

Anode Material:

X-ray Energy:

Overall Energy Resolution (eV):

Calibration:

Charge Reference:

Internal hydrocarbon

Energy Scale Evaluation:

Reliable, with one-point correction of energy scale

Comment:

18 A Cu/(-C4SH((CH2)5CH3)-)n. The substrate composition determined by XPS was C10S. Branching ratio = 0.5.

Specimen:

Method of Determining Specimen Composition:

Method of Determining Specimen Crystallinity:

Specimen Temperature (K):

300