There was a problem with the connection!

NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

Details Summary:
Summary Page
Tab Page Summary

General:
Element:
Si
Formula:
SiH0.02
Name:
silicon hydride (SiH0.02)
CAS Registry No:
Class:
alloy, hydride

Citation:
Author Name(s):
Das S.R., Webb J.B., de Castro S.C., Sundaram V.S.
Journal:
J. Appl. Phys. 60, 2530
DOI:
Pub Year:
1986

Data Processing:
Data Type:
Photoelectron Line
Line Designation:
2p3/2
Binding Energy (eV)
98.90
Energy Uncertainty:
0.1
Background Subtraction Method:
Peak Location Method:
data
Full Width at Half-maximum Intensity (eV):
Gaussian Width (eV):
Lorentzian Width (eV):

Measurement:
Use of X-ray Monochromator:
No
Anode Material:
Al
X-ray Energy:
Overall Energy Resolution (eV):
Calibration:
Au4f7 = 84.00
Charge Reference:
Adventitious carbon
Energy Scale Evaluation:
Reliable, with one-point correction of energy scale
Comment:
The samples were prepared by planar rf reactive magnetron sputtering at substrate temperature of 300 K. The sample consists of high-density regions of 50-200 A lateral dimensions separated by a low-density network.

Specimen:
Specimen:
Method of Determining Specimen Composition:
Method of Determining Specimen Crystallinity:
Specimen Temperature (K):
300
An error has occurred. This application may no longer respond until reloaded. Reload 🗙