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NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0
Reliable (reported energy within 300 eV of a reference energy)
Comment:
100 L CH3I were adsorbed onto Pd(100) at 200 K. The spectra were taken during continuous dosing at a CH3I pressure of 3.3E-6 Pa. The substrate treatment: Ar+ ion sputtering (Ep=1 keV, j=5 microamperes/cm-2), annealing (T = 1000 K), oxidation (T = 700 K), and annealing (T = 1000 K).