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NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0
Reliable (reported energy within 300 eV of a reference energy)
Comment:
0.4 ML PF3/Ru(0001). The substrate was cleaned by Ne+ ion bombardment (Ep = 3 keV), O2 treatment and annealing (T = 1600 K). The branching ratio = 0.515.