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NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

Details Summary:
Summary Page
Tab Page Summary

General:
Element:
Si
Formula:
Si/NH3
XPS Formula:
silicon atoms attached to H
Name:
silicon/ammonia
CAS Registry No:
7440-21-3
Class:
element, hydride, nitride

Citation:
Author Name(s):
Dufour G., Rochet F., Roulet H., Sirotti F.
Journal:
Surf. Sci. 304, 33
DOI:
Pub Year:
1994

Data Processing:
Data Type:
Chemical Shift
Line Designation:
CS-2p
Chemical Shift (eV)
0.37
Energy Uncertainty:
Background Subtraction Method:
other
Peak Location Method:
mixed Gaussian/Lorentzian
Full Width at Half-maximum Intensity (eV):
Gaussian Width (eV):
0.45
Lorentzian Width (eV):
0.1

Measurement:
Use of X-ray Monochromator:
Yes
Anode Material:
other source
X-ray Energy:
135
Overall Energy Resolution (eV):
0.3
Calibration:
FL = Fermi level
Charge Reference:
Element
Energy Scale Evaluation:
Reliable (reported energy within 300 eV of a reference energy)
Comment:
60 L NH3 were adsorbed onto Si(001)-(2x1) at 90 K. The Si wafer was cleaned by heating at 1323 K for 15 s. The relative intensity was 0.170. Branching ratio = 0.5.

Specimen:
Specimen:
Method of Determining Specimen Composition:
Method of Determining Specimen Crystallinity:
Low-energy Electron Diffraction
Specimen Temperature (K):
90
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