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NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0
Reliable (reported energy within 300 eV of a reference energy)
Comment:
60 L NH3 were adsorbed onto Si(001)-(2x1) at 90 K. The Si wafer was cleaned by heating at 1323 K for 15 s. The relative intensity was 0.171. Branching ratio = 0.5.