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NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

Details Summary:
Summary Page
Tab Page Summary

General:
Element:
Ta
Formula:
Ta2N
Name:
ditantalum nitride
CAS Registry No:
Class:
nitride

Citation:
Author Name(s):
Prieto P., Galan L., Sanz J.M.
Journal:
Appl. Surf. Sci. 70, 186
DOI:
Pub Year:
1993

Data Processing:
Data Type:
Photoelectron Line
Line Designation:
4f7/2
Binding Energy (eV)
22.85
Energy Uncertainty:
Background Subtraction Method:
Peak Location Method:
data
Full Width at Half-maximum Intensity (eV):
1.6
Gaussian Width (eV):
Lorentzian Width (eV):

Measurement:
Use of X-ray Monochromator:
No
Anode Material:
Mg
X-ray Energy:
Overall Energy Resolution (eV):
Calibration:
FL = Fermi level
Charge Reference:
Conductor
Energy Scale Evaluation:
Reliable (reported energy within 300 eV of a reference energy)
Comment:
Ta2N thin film 3000 A thick was grown onto glass by reactive sputtering in a nitrogen atmosphere. The sample was cleaned by cycles of Ar+ ion bombardment (Ep = 2 keV, j = 2 microamperes cm-2) and annealing (T = 1300 K).

Specimen:
Specimen:
Method of Determining Specimen Composition:
Method of Determining Specimen Crystallinity:
X-ray Diffraction
Specimen Temperature (K):
300
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