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NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0
Reliable (reported energy within 300 eV of a reference energy)
Comment:
22 A Ta2O5/3000 A Ta2N/glass. The oxide film was prepared by oxidation of Ta2N in atmospheric air (40 % humidity, T = 300 K, time = 3min). Ta2N thin film was grown by reactive sputtering in a nitrogen atmosphere.