NIST X-ray Photoelectron Spectroscopy Database

NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

Details Summary:

Tab Page Summary

General:

C

CH₃OH/Si

CHx species

methanol/silicon

CAS Registry No:

67-56-1

alcohol, catalyst

Citation:

Author Name(s):

Tanaka K., Matsuzaki S., Toyoshima I.

J. Phys. Chem. 97, 5673

Pub Year:

1993

book All Records in this Publication

Data Processing:

Photoelectron Line

Line Designation:

1s

Binding Energy (eV)

284.10

Energy Uncertainty:

Background Subtraction Method:

Peak Location Method:

data

Full Width at Half-maximum Intensity (eV):

Gaussian Width (eV):

Lorentzian Width (eV):

Measurement:

Use of X-ray Monochromator:

No

Anode Material:

Mg

X-ray Energy:

Overall Energy Resolution (eV):

Calibration:

Si2p = 99.34

Charge Reference:

Conductor

Energy Scale Evaluation:

Reliable, with one-point correction of energy scale

Comment:

1 L CH3OH was vaporized at 298 K and deposited onto B-doped p-type Si(111) wafer with a resistivity of 1.6 - 2.1 ohm cm. Substrate temperature = 473 K and 573 K. The substrate was cleaned by repeating an Ar+ ion bombardment at 298 K and resistive heating at 623 K, then finally annealed at 1273 K for 30 s.

Specimen:

Method of Determining Specimen Composition:

Method of Determining Specimen Crystallinity:

Specimen Temperature (K):

473, 573

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