NIST X-ray Photoelectron Spectroscopy Database

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Total Records: 8

Element

Atomic No

Formula

Spectral Line

Energy (eV)

Details

CH₃OH/Si

287.00

CH₃OH/Si

286.80

CH₃OH/Si

285.10

CH₃OH/Si

284.10

CH₃OH/Si

284.10

HCHO/Si

285.40

CH₃OH/Si

286.80

CH₃OH/Si

286.80

Data Processing:

Photoelectron Line

285.40

Background Subtraction Method:

Peak Location Method:

data

Full Width at Half-maximum Intensity (eV):

Gaussian Width (eV):

Lorentzian Width (eV):

Measurement:

Use of X-ray Monochromator:

Anode Material:

X-ray Energy:

Overall Energy Resolution (eV):

Calibration:

Si2p = 99.34

Charge Reference:

Conductor

Energy Scale Evaluation:

Reliable, with one-point correction of energy scale

Comment:

0.1 L HCHO was deposited onto B-doped p-type Si(111) wafer with a resistivity of 1.6 - 2.1 ohm cm. The C1s spectrum has a tail toward lower binding energy. The substrate was cleaned by repeating an Ar+ ion bombardment at 298 K and resistive heating at 623 K, then finally annealed at 1273 K for 30 s.

Specimen:

Method of Determining Specimen Composition:

Method of Determining Specimen Crystallinity:

Specimen Temperature (K):

298