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NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0
Reliable (reported energy within 300 eV of a reference energy)
Comment:
An exposure of 30 L CH3OH onto Pd(100) at 300 K and 600 K was followed by continuous dosing at 5E-9 mbar both 450 K and 500 K. The substrate was cleaned by Ar+ ion bombardment (1 keV, 2 microamperes/cm2), annealing (T = 1100 K), O2 treatment (1E-7 mbar at 800 K), and short annealing at 1200 K.