NIST X-ray Photoelectron Spectroscopy Database

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Total Records: 6

Element

Atomic No

Formula

Spectral Line

Energy (eV)

Details

TaB₂/Ta

188.90

O₂/B/TaB₁.₉₄/Ta

193.30

O₂/B/TaB₁.₉₄/Ta

187.90

O₂/B/TaB₁.₉₄/Ta

193.40

O₂/B/TaB₁.₉₄/Ta

187.90

B/TaB₁.₉₄/Ta

187.90

Data Processing:

Photoelectron Line

187.90

Background Subtraction Method:

Linear

Peak Location Method:

Gaussian

Full Width at Half-maximum Intensity (eV):

Gaussian Width (eV):

Lorentzian Width (eV):

Measurement:

Use of X-ray Monochromator:

Anode Material:

X-ray Energy:

Overall Energy Resolution (eV):

Calibration:

Ag3d5 = 368.27

Charge Reference:

Energy Scale Evaluation:

Reliable, with one-point correction of energy scale

Comment:

B/TaB1.94/Ta(110). The boron thin film was grown at 650 -700 K and annealed to 1000 K. The B2H6/Ar mixture was used. TaB2 was prepared by thermal decomposition of B2H6. FAT mode. The substrate was cleaned by cycles of Ar+ ion bombardment (Ep = 2 keV, Ip = 8 - 10 microamperes) and annealing (T = 2700 K). FAT mode.

Specimen:

Method of Determining Specimen Composition:

X-ray Photoelectron Spectroscopy

Method of Determining Specimen Crystallinity:

X-ray Diffraction

Specimen Temperature (K):

300