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NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

Details Summary:
Summary Page
Tab Page Summary

General:
Element:
N
Formula:
TiN0.9
Name:
titanium nitride/stainless steel
CAS Registry No:
25583-20-4
Class:
nitride

Citation:
Author Name(s):
Prieto P., Kirby R.E.
Journal:
J. Vac. Sci. Technol. A 13, 2819
DOI:
Pub Year:
1995

Data Processing:
Data Type:
Photoelectron Line
Line Designation:
1s, sat
Binding Energy (eV)
398.67
Energy Uncertainty:
0.05
Background Subtraction Method:
other
Peak Location Method:
mixed Gaussian/Lorentzian
Full Width at Half-maximum Intensity (eV):
Gaussian Width (eV):
Lorentzian Width (eV):

Measurement:
Use of X-ray Monochromator:
No
Anode Material:
Mg
X-ray Energy:
Overall Energy Resolution (eV):
0.75
Calibration:
Ag3d5, PdFL= 368.27, 0.0
Charge Reference:
Conductor
Energy Scale Evaluation:
Reliable, with one-point correction of energy scale
Comment:
The 14-nm-thin TiN film was grown by reactive evaporation of Ti in a nitrogen atmosphere (p = 5E-4 - 5E-6 Torr). The thickness was measured using a quartz-crystal thickness monitor. FAT mode. Emission angle = 15 degrees.

Specimen:
Specimen:
Method of Determining Specimen Composition:
Method of Determining Specimen Crystallinity:
Specimen Temperature (K):
300
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