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NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0
Reliable (reported energy within 300 eV of a reference energy)
Comment:
CH3SH was adsorbed onto W(001) at 100 K. Sulfur coverage is 0.59. The substrate was cleaned by O2 treatment (p = 5E-8 Torr) and heating (T = 1000 - 2300 K).