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NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

Details Summary:
Summary Page
Tab Page Summary

General:
Element:
S
Formula:
CH3SH/W
XPS Formula:
methyl thiolate residing in hollow sites
Name:
methanethiol/tungsten
CAS Registry No:
74-93-1
Class:
element, thiol

Citation:
Author Name(s):
Mullins D.R., Lyman P.F.
Journal:
J. Phys. Chem. 97, 9226
DOI:
Pub Year:
1993

Data Processing:
Data Type:
Photoelectron Line
Line Designation:
2p3/2
Binding Energy (eV)
163.70
Energy Uncertainty:
0.04
Background Subtraction Method:
Peak Location Method:
data
Full Width at Half-maximum Intensity (eV):
Gaussian Width (eV):
Lorentzian Width (eV):

Measurement:
Use of X-ray Monochromator:
No
Anode Material:
other source
X-ray Energy:
208
Overall Energy Resolution (eV):
0.50
Calibration:
Cu3p, L3MM, 2p3 = 75.14, 334.95, 932.67
Charge Reference:
Conductor
Energy Scale Evaluation:
Reliable (reported energy within 300 eV of a reference energy)
Comment:
CH3SH was adsorbed onto W(001) at 100 K and annealed to 250 K. Sulfur coverage is 0.24. The substrate was cleaned by O2 treatment (p = 5E-8 Torr) and heating (T = 1000 - 2300 K).

Specimen:
Specimen:
Method of Determining Specimen Composition:
Auger Electron Spectroscopy
Method of Determining Specimen Crystallinity:
Specimen Temperature (K):
100
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