Reliable (reported energy within 300 eV of a reference energy)
Comment:
CH3SH was adsorbed onto W(001) at 100 K and annealed to 100 - 250 K. Sulfur coverage is 0.27. The substrate was cleaned by O2 treatment (p = 5E-8 Torr) and heating (T = 1000 - 2300 K).