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NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0
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General:
Citation
Data Processing:
Measurement:
Specimen:
Element:
Si
Formula:
Si
XPS Formula:
surface state
Name:
silicon
CAS Registry No:
7440-21-3
Class:
element, II-VI semiconductor, IV semiconductor
Author Name(s):
Safta N., Lacharme J.P., Cricenti A., Taleb-Ibrahimi A., Indlekofer G., Aristov V., et al.
Journal:
Nucl. Instruments Methods in Phys. Res. Sec. B 97, 372
DOI:
110.1016/0168-583X(94)00355-6
Pub Year:
1995
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Total Records:
14
Element
Atomic No
Formula
Spectral Line
Energy (eV)
Details
Si
14
Si
DS-2p
0.61
Si
14
Si
SS-2p
3/2
0.00
Si
14
Si
SS-2p
3/2
0.00
Si
14
Si
SS-2p
3/2
-0.44
Si
14
Si
SS1-2p
3/2
0.70
Si
14
Si
SS1-2p
3/2
0.76
Si
14
Si
SS2-2p
3/2
0.20
Si
14
Si
SS2-2p
3/2
0.20
Si
14
Si
SS3-2p
3/2
-0.15
Si
14
Si
SS3-2p
3/2
-0.15
Si
14
Si
SS4-2p
3/2
-0.40
Si
14
Si
SS4-2p
3/2
-0.40
Si
14
Si
SS5-2p
3/2
-0.89
Si
14
Si
SS5-2p
3/2
-0.89
Data Type:
Surface Core-level Shift for the Second Layer of Atoms
Line Designation:
SS1-2p
3/2
Surface Core-Level Shift (eV) for the first Layer of Atoms:
0.70
Energy Uncertainty:
Background Subtraction Method:
other
Peak Location Method:
mixed Gaussian/Lorentzian
Full Width at Half-maximum Intensity (eV):
Gaussian Width (eV):
0.55
Lorentzian Width (eV):
0.035
Use of X-ray Monochromator:
No
Anode Material:
other source
X-ray Energy:
151
Overall Energy Resolution (eV):
Calibration:
Charge Reference:
Conductor
Energy Scale Evaluation:
Reliable (reported energy within 300 eV of a reference energy)
Comment:
Si(110)-(2x8). The sample was cleaned by annealing at ~ 1173 K. FAT mode. The spectra were recorded at normal emission. Branching ratio = 0.61.
Specimen:
crystal, semiconductor, wafer
Method of Determining Specimen Composition:
Method of Determining Specimen Crystallinity:
Low-energy Electron Diffraction
Specimen Temperature (K):
300
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