NIST X-ray Photoelectron Spectroscopy Database

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Total Records: 14

Element

Atomic No

Formula

Spectral Line

Energy (eV)

Details

DS-2p

0.60

Li/Si

DS-2p

0.60

Li/Si

INT-1s

0.00

Li/Si

INT-2p_3/2

0.00

Li/Si

INT-2p_3/2

-0.37

SS-2p_3/2, sat

1.37

Si/Li

SS1-2p_3/2

-0.37

SS1-2p_3/2

-0.49

SS2-2p_3/2

0.20

Li/Si

SS2-2p_3/2

0.22

Si/Li

SS2-2p_3/2

0.22

Si/Li

SS3-2p_3/2

-0.22

Li/Si

SS3-2p_3/2

-0.22

SS3-2p_3/2

-0.24

Data Type:

Surface Core-level Shift for the Third Layer of Atoms

Line Designation:

SS3-2p_3/2

Surface Core-Level Shift (eV) for the third Layer of Atoms:

-0.22

Energy Uncertainty:

Background Subtraction Method:

other

Peak Location Method:

mixed Gaussian/Lorentzian

Full Width at Half-maximum Intensity (eV):

Gaussian Width (eV):

0.215

Lorentzian Width (eV):

0.085

Use of X-ray Monochromator:

Yes

Anode Material:

other source

X-ray Energy:

130

Overall Energy Resolution (eV):

0.1

Calibration:

Charge Reference:

Element

Energy Scale Evaluation:

Reliable (reported energy within 300 eV of a reference energy)

Comment:

n-type P-doped Si(100)-(2x1) with a resistivity of 0.67 - 1.33 ohm cm. Branching ratio = 0.5

Specimen:

annealed, chemically etched, crystal, surface coverage from 1ML to 2ML (1ML <= coverage < 2ML), vapor deposited

Method of Determining Specimen Composition:

Method of Determining Specimen Crystallinity:

Low-energy Electron Diffraction

Specimen Temperature (K):

300